Chemistry - Alkenes and Aromatics - Coursework Example

Formation of oxide ion is favored when oxygen combines with metals that have low ionization energy; to start with the oxides of carbon include carbon monoxide (CO) carbon dioxide (CO2) dicarbon monoxide (C2O) carbon trioxide (CO3). These oxides of carbon are colorless, odorless, carbon dioxide gas is detectable because it forms a mist-like cloud with clean water. Carbon is non-metal while silicon is a metalloid and lead is a metal, therefore metalloid oxides will form amphoteric oxides.

 Oxides of lead include lead II oxide, lead IV oxide, and lead VI oxide; PBO which is lead II oxide is a powerful oxidizing agent which is yellow in color and sometimes rhombic.

Silicon oxides include silicon dioxide, remember silicon monoxide does not exist, physical properties include high melting point and boiling point but carbon dioxide and lead oxide have a low melting point because they form a small discreet unit and have a weak attraction to each other because they are not purely ion, carbon dioxide forms a discreet molecule joined together by weak forces but silicon dioxide has three dimension network and stable because it has no weak forces. Carbon dioxide and oxides of lead exist in gaseous form butoxide of silicon exist in solid form.

Under physical properties, the structures of oxides of silicon form a three-dimension network normally found in a solid form unlike its counterpart of carbon dioxide, this is because carbon dioxide forms a linear structure and this is the reason why carbon dioxide has low melting and boiling point. Silicon dioxide forms a trigonal planar structure with a lone pair but has various crystal structures. Silicon monoxide does not exist, while oxide of lead forms a pyramidal structure.

Silicon oxide reacts with strong bases showing the acidic character of this oxide. Other oxides of carbon and lead will give acid; lead oxide is a powerful oxidizing agent. Lead oxide reacts with both acids and bases giving lead oxide amphoteric character.