Helium Ion Scanning Electron Microscope - Report Example

Helium Ion SEM Name Course Name and Code Instructor’s Name Date Introduction Technological advancement has seen advancement in many sectors and the application of these technologies has also expanded. An area that is seen extensive technological advancement is the area of imaging, such as microscopy imaging. Scanning electron microscopy has been utilised for imaging purposes for a long and has also been used as a measurement tool. This technology is still a primary tool that is utilised in numerous manufacturing and research around the world. However, advancement in technology has resulted in the development of new technology such as the helium ion microscope. The helium ion microscope is a new metrology and imaging technology. The entire technology is based on substitution of some parts into creating the new technology that has advanced capability. Therefore, the aim of this paper is to analyse and discuss helium ion microscope and specifically on current technology and future advances in the technology. Current Technology Helium ion SEM is a new technology that is based on surface image technique and usually involves beaming a focused helium ions beam across a surface and through the process, an image is processed from the secondary electron emission; the entire process be viewed as similar as the scanning electron microscopy (Boden et al., 2010). The quality of the image is obtained through a source, which is atomically sharp and extremely bright plus the larger momentum of helium ions compared to other electronics (Economou, Notte and Thompson, 2012). Another quality that makes helium ion as an important component in imaging is the ability of the ions to penetrate further and rests deeper into the component, which is been analysed (Boden et al., 2010). In addition, helium ions produces a sub-nm size probe resulting in production of fewer collision cascades in which it results in smaller interaction volume near to the surface and hence reduces challenges of injuries or spoiling of the sample (Economou, Notte and Thompson, 2012). According to Postek and Vladar (2008), the helium ion SEM offers numerous advantages compared to other SEM. For example, the interaction volume surface of the helium beam is considerable smaller compared to other SEM. This is because the helium beam produces both scatter ions and secondary electrons after penetration of the sample (Economou, Notte and Thompson, 2012). The huge amounts of secondary electrons make imaging with low probe currents to become more feasible. In addition, the amount of scattered ions is directly proportional to square of atomic number and obtaining such information provides exceptional material information of the component. Another benefit associated with the helium technology is its optical information about a given sample. Some materials or samples produce photons when the helium ion beam comes into conduct with the sample (Economou, Notte and Thompson, 2012). The production of the photons may be associated with traditional imaging which results with cathodoluminescence effect but there is additional benefit associated with utilisation of helium ion technology. When helium ion beams enters a sample, it causes a free electron resulting in cascading of energy to its ground state. This process is only possible when numerous photos are produced from the sample and the ability of escaping from the sample. Through this process, a clear image can be produced. The first helium ion technology was dubbed ORION and was situated in Gaithersburg in 2006. Subsequent advancement in technology resulted in reduced image vibrations and emission current allowing better image resolution (Cohen-Tanugi & Yao, 2008). The scientists who embraced ORION aimed to understand properties of the instrument since the beam produced interacts different with the sample compared to other imaging methods (Economou, Notte and Thompson, 2012). Some of the information obtained by the scientists and researchers include minimal charging, surface sensitivity and high resolution. ORION for example was not utilised only as an imaging instrument but has also been utilised in nano-fabrication. Some of the earliest researches were delivering specific stress in a membrane. Continued advancement in the technology has resulted in utilisation of helium beam is in beam assisted chemistry and lithography (Economou, Notte and Thompson, 2012). The important component of lithography is the resolution. Moreover, another component is what is referred to as proximity effect in which exposure of an area is analysed relative to the surrounding areas (Cohen-Tanugi & Yao, 2008). In addition, the technique can be utilised in mesoporous materials that are template by numerous crystalline phases for environmental remediation, chromatography, drug delivery and other applications. In utilising the helium ion instrument, information on structure on pores and their connectivity were able to be achieved and without the strategy could mean without such technique could mean such outcome could be viable (Terpstra et al., 2013). This is exemplified in its utilisation in bioengineering. In bioengineering, the technique is utilised in understanding biocompatibility of medical implants since the success is dependent on the nature of interface (Economou, Notte and Thompson, 2012). The aim of implants is to promote cellular response, which is similar to natural tissues (Cohen-Tanugi & Yao, 2008). Imaging through helium ion technology allows mineralisation of the surface of the implant. Utilisation of helium ion beam allows high-resolution characterisation resulting in better understanding outcome of implantation in advance. Graphene is a technologically important material that is believed to introduce into nano-scale electronic devices due to its unique characteristics and properties. The helium ion microscope can be utilised in nano-fabrication (Boden et al., 2010). This is achieved through milling features in the graphene to allow the production of nano-electronic devices. With the help of gas injection system, helium ion technology can be utilised to deposit metal onto a specific surface with the aim of creating patterns, which are intricate. The ORION system has been utilised in Harvard University to sputter grapheme films with the aim of creating patterns (Cohen-Tanugi & Yao, 2008). In addition, National University of Singapore utilised the helium ion beam on grapheme films. This illustrates the importance of nano technology and grapheme films. Moreover, research has been carried out to demonstrate usefulness of helium ion microscopy (Aconomou, Notte and Thompson, 2012). Advancement of helium ion technology has shown it operates better compared to traditional imaging techniques due to the span and difficulty of samples analysed. Future Development of the Technology The helium ion technology is still new and requires future improvements to ensure the tool becomes more effective. Some of the measures that should be introduced for future improvements include: The development of helium ion technology is anticipated to contribute immensely towards nanotechnology and challenging imaging applications. Gas system injection technology in collaboration with helium ion mechanisms is an area that requires additional research and studies (Economou, Notte and Thompson, 2012). This type of research is in infant stage and it is paramount to optimise the process with the aim of achieving its full capabilities and also the techniques associated with the technique (Cohen-Tanugi & Yao, 2008). Some of the challenges that may be faced during this process include unwanted deposition and damage that might be caused by the beam and this can be a problematic for combination of mill and deposition techniques with the aim of fabrication and other advancements on graphene nano-electronic devices (Veldhoven, 2010). Even though, challenges are evidenced, the device characterisation capabilities and rapid prototyping provided by the technique can be utilised to improve imaging techniques beyond traditional methods. Research on helium ion instrumentation should be continued to ensure the instrument is better understood since it is still new microscopy equipment (Cohen-Tanugi & Yao, 2008). Researchers and scientists should study the equipment with the aim of improving this imaging tool to improve its performance and also to understand the physics behind the signal generation mechanism (Economou, Notte and Thompson, 2012). Lack of enough information on the instrument especially signals generation and the imaging mechanisms. Therefore, enough studies should be done on the instrument. Other sections that require further research and studies include helium ion beam specimen interactions, generation, and improvement on contrast mechanism (Economou, Notte and Thompson, 2012). Conclusion Helium ion instrumentation is a new technology that has been utilised in imaging and employs the use of helium ion beam. Helium ion SEM has numerous benefits compared to traditional imaging techniques. Some of the benefits associated with the technology include quality image, patterning capabilities and acquiring additional information, which could not have been possible with the use of traditional imaging technique. This can be achieved through the shorter helium ions wavelength, high source of brightness, which allows obtaining of qualitative data that cannot be achieved with traditional microscopes that utilises electrons or photons as the source of emission. The aspect is based on how the beam interacts with the sample because it does not suffer from excitation and thus provides images that are sharper across numerous materials. The technology can be utilised across different technology innovations include bioengineering, patterning, spectroscopy and biological imaging. However, the technology is still new and requires more improvements to optimise its operations. Some of the areas that requires future studies include how the helium ion tool operates, how the tool can be utilise to generate different type of images and how the tool can be optimised to produce higher quality images. References Boden, S., Moktadir, Z., Bagnall, D., Mizuta, H., & Rutt, H. (2011). Focused helium ion beam milling and deposition. Microelectronic Engineering, 88, 2452-2455 Cohen-Tanugi, D., & Yao, N. (2008). Superior imaging resolution in scanning helium-ion microscopy: A look at beam-sample interactions. Journal of Applied Physics, 104, 1 – 7 Economou, N., Notte, J., & Thompson, W. (2012). The History and Development of the Helium Ion Microscope. Scanning, 34, 83-89 Postek, M., & Vladar, A. (2008). Helium Ion Microscopy and Its Application to Nanotechnology and Nanometrology. Scanning, 30, 457-462 Terpstra, A., Shopsowitz, K., Gregory, C., Manning, A., Michal, C., Hamad, W., Yang, J., & MacLachlan, M. (2013). Helium ion microscopy: a new tool for imaging novel mesoporous silica and organosilica materials. Chem. Commun., 49, 1645-1647 Veldhoven, E. (2010). Nanofabrication with a high resolution helium beam. Microsc Microanal, 1, 202–203. Read More

The first helium ion technology was dubbed ORION and was situated in Gaithersburg in 2006. Subsequent advancement in technology resulted in reduced image vibrations and emission current allowing better image resolution (Cohen-Tanugi & Yao, 2008). The scientists who embraced ORION aimed to understand properties of the instrument since the beam produced interacts different with the sample compared to other imaging methods (Economou, Notte and Thompson, 2012). Some of the information obtained by the scientists and researchers include minimal charging, surface sensitivity and high resolution.

ORION for example was not utilised only as an imaging instrument but has also been utilised in nano-fabrication. Some of the earliest researches were delivering specific stress in a membrane. Continued advancement in the technology has resulted in utilisation of helium beam is in beam assisted chemistry and lithography (Economou, Notte and Thompson, 2012). The important component of lithography is the resolution. Moreover, another component is what is referred to as proximity effect in which exposure of an area is analysed relative to the surrounding areas (Cohen-Tanugi & Yao, 2008).

In addition, the technique can be utilised in mesoporous materials that are template by numerous crystalline phases for environmental remediation, chromatography, drug delivery and other applications. In utilising the helium ion instrument, information on structure on pores and their connectivity were able to be achieved and without the strategy could mean without such technique could mean such outcome could be viable (Terpstra et al., 2013). This is exemplified in its utilisation in bioengineering.

In bioengineering, the technique is utilised in understanding biocompatibility of medical implants since the success is dependent on the nature of interface (Economou, Notte and Thompson, 2012). The aim of implants is to promote cellular response, which is similar to natural tissues (Cohen-Tanugi & Yao, 2008). Imaging through helium ion technology allows mineralisation of the surface of the implant. Utilisation of helium ion beam allows high-resolution characterisation resulting in better understanding outcome of implantation in advance.

Graphene is a technologically important material that is believed to introduce into nano-scale electronic devices due to its unique characteristics and properties. The helium ion microscope can be utilised in nano-fabrication (Boden et al., 2010). This is achieved through milling features in the graphene to allow the production of nano-electronic devices. With the help of gas injection system, helium ion technology can be utilised to deposit metal onto a specific surface with the aim of creating patterns, which are intricate.

The ORION system has been utilised in Harvard University to sputter grapheme films with the aim of creating patterns (Cohen-Tanugi & Yao, 2008). In addition, National University of Singapore utilised the helium ion beam on grapheme films. This illustrates the importance of nano technology and grapheme films. Moreover, research has been carried out to demonstrate usefulness of helium ion microscopy (Aconomou, Notte and Thompson, 2012). Advancement of helium ion technology has shown it operates better compared to traditional imaging techniques due to the span and difficulty of samples analysed.

Future Development of the Technology The helium ion technology is still new and requires future improvements to ensure the tool becomes more effective. Some of the measures that should be introduced for future improvements include: The development of helium ion technology is anticipated to contribute immensely towards nanotechnology and challenging imaging applications. Gas system injection technology in collaboration with helium ion mechanisms is an area that requires additional research and studies (Economou, Notte and Thompson, 2012).

This type of research is in infant stage and it is paramount to optimise the process with the aim of achieving its full capabilities and also the techniques associated with the technique (Cohen-Tanugi & Yao, 2008).

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